Electron Microscopes
Electron Microscopy Sciences Graphene Oxide Support film on Quantifoil R2/4, Cu 200 mesh
Graphene Oxide (GO) support film is a super thin (<1nm), naturally hydrophilic layer placed over the support film on grids. Pre-treatment of GO Support Films is unnecessary - by default, the hydrophilic surface spreads particles evenly across the grid. A hydrophobic surface can be achieved by heating in the air.
It works well with holey carbon, lacey carbon, and Quantifoil grid types, effectively spanning the gaps. It is less expensive than graphene to produce due to complexity of graphene manufacturing and has a better background contrast than graphene resulting in higher resolution. Nearly transparent in electron beam and barely visible under optical microscopes. Regular batch checking ensures correct coverage of monomers.
Note: plasma cleaning or glow discharge will damage the support film.
Material: Copper
Mesh: 200
Electron Microscopy Sciences TEM Window Grid Silicon Nitride Film, 500 µm, 20 nm
Silicon Nitride TEM Window Grids perform well under harsh conditions. They tolerate temperatures above 1000 deg C and support use in environmental TEMs where dynamic processes are observed at high temperatures. They provide an ideal balance of imaging resolution, chemical stability and mechanical strength. They can be vigorously plasma cleaned to remove organic contamination. The incorporate LPCVD, low-stress(~250MPa), non-stoichiometric silicon nitride to provide flat, insulating and hydrophobic surfaces.
Silicon frames are 100um thick. There is less than 0.5 nm variation in film thickness across an entire production log, not just a single window grid. Grids fit standard 3mm holders and most double tilt holders. They come in clear gel-boxes for simpler sample preparation.
Dimensions: 500 µm
Thickness: 20 nm
Electron Microscopy Sciences Graphene Oxide Support film on Quantifoil R2/4, Cu 200 mesh
Graphene Oxide (GO) support film is a super thin (<1nm), naturally hydrophilic layer placed over the support film on grids. Pre-treatment of GO Support Films is unnecessary - by default, the hydrophilic surface spreads particles evenly across the grid. A hydrophobic surface can be achieved by heating in the air.
It works well with holey carbon, lacey carbon, and Quantifoil grid types, effectively spanning the gaps. It is less expensive than graphene to produce due to complexity of graphene manufacturing and has a better background contrast than graphene resulting in higher resolution. Nearly transparent in electron beam and barely visible under optical microscopes. Regular batch checking ensures correct coverage of monomers.
Note: plasma cleaning or glow discharge will damage the support film.
Material: Copper
Mesh: 200
Electron Microscopy Sciences Graphene Oxide Support film on Quantifoil R2/4, Cu 300 mesh
Graphene Oxide (GO) support film is a super thin (<1nm), naturally hydrophilic layer placed over the support film on grids. Pre-treatment of GO Support Films is unnecessary - by default, the hydrophilic surface spreads particles evenly across the grid. A hydrophobic surface can be achieved by heating in the air.
It works well with holey carbon, lacey carbon, and Quantifoil grid types, effectively spanning the gaps. It is less expensive than graphene to produce due to complexity of graphene manufacturing and has a better background contrast than graphene resulting in higher resolution. Nearly transparent in electron beam and barely visible under optical microscopes. Regular batch checking ensures correct coverage of monomers.
Note: plasma cleaning or glow discharge will damage the support film.
Material: Copper
Mesh: 300
Electron Microscopy Sciences TEM Window Grid Silicon Nitride Film, (8) 100 µm, (1) 100x350 µm, 20 nm
Silicon Nitride TEM Window Grids perform well under harsh conditions. They tolerate temperatures above 1000 deg C and support use in environmental TEMs where dynamic processes are observed at high temperatures. They provide an ideal balance of imaging resolution, chemical stability and mechanical strength. They can be vigorously plasma cleaned to remove organic contamination. The incorporate LPCVD, low-stress(~250MPa), non-stoichiometric silicon nitride to provide flat, insulating and hydrophobic surfaces.
Silicon frames are 100um thick. There is less than 0.5 nm variation in film thickness across an entire production log, not just a single window grid. Grids fit standard 3mm holders and most double tilt holders. They come in clear gel-boxes for simpler sample preparation.
Dimensions: (8) 100 µm, (1) 100x350 µm
Thickness: 20 nm
Electron Microscopy Sciences Light Yellow Melamine Thermosetting Hot Mount Resin 1 KG
Light yellow melamine with mineral and glass filler, thermosetting. For soft to medium hard materials. Excellent edge retention.
Electron Microscopy Sciences Black Bakelite Thermosetting Hot Mount Resin 1 KG
Black bakelite with wood filler, thermosetting. Routine examination of soft to medium hard materials. Suitable as backing.
World Precision Instrument SU-MPC325 Motorized Micromanipulator Systems-SU-MPC325-4
The SU-MP225 represents an economical alternative to the SU-MP285 and SU- MPC365. In 2002, production and design changes allowed us to produce this motorized manipulator as a more affordable alternative to the industry standard SU-MP285. While the SU-MP225 feature set is less comprehensive than the SU-MP285, it includes the most popular features with an efficient user interface. The mechanical design utilizes a miniature stepper motor and integral anti-backlash gear head. Pre-loaded ball bearing slides provide smooth movement throughout the 25 mm of travel. The controller uses low-noise, linear-drive output circuitry identical to that found in the SU-MP285. The methodology for mounting pipette holders and headstages used with the MP-285 has been maintained in the SU-MP225 to allow for cross compatibility.
World Precision Instrument SU-MP85 Micromanipulator-SU-MP85-L
The classic micromanipulator developed by Sir Huxley many years ago is still considered by many investigators to be the finest manual micromanipulator available. The SU-MP85 offers the advantage of a very large range of movement with its built-in coarse manipulator and precise submicron movement with the fine controls. Coarse positioning is achieved with a three axis manipulator mounted on top. The ultrafine positioning is accomplished with the large micrometers mounted on the base. These micrometers provide smooth, precise movement through a 10:1 reduction mechanism.
Electron Microscopy Sciences AFM Substrate Ultra-Flat Silicon Wafer 6", 150 mm diameter, <100> Orientation
These ultra-flat wafers can be used for substrate studies or as substrate for AFM and SEM samples by cleaving the wafer.
Diameter: 150 mm
Orientation: <100>
Thickness: 675 µm±20 µm
Roughness: Typically 2-3Å
Resistivity: 10-20 Ohm-cm
Electron Microscopy Sciences AFM Substrate Type P Silicon Wafer 4", 100 mm diameter, <100> Orientation
These silicon wafers can be used for substrate studies or as substrate for AFM and SEM samples by cleaving the wafer. The wafers are polished on one side.
Diameter: 100 mm
Orientation: <100>
Thickness: 475-575 µm
Roughness: 2nm
Resistance: 1-30 ohms
Electron Microscopy Sciences Carbon Support Film 5-6 nm thick on Square 300 mesh Copper Grid
A thin film of pure carbon. All of our coated grids are optically checked followed by batch testing in the EM. Packed in grid storage box. NOTE: All of our film is laid on the shiny side of the grid. Standard thickness is 5-6 nm.
Grid: Copper
Electron Microscopy Sciences Graphene on Thermal SiO2 on Ultra-Flat Silicon, 3-5 layers, 1.0-1.7 nm thick, 85.8-90.4% Transparency
CVD graphene on ultra-flat thermal SiO2. The high quality graphene is produced by chemical vapor deposition, a process by which gaseous reactants are deposited onto a substrate. The Ultra-flat Thermal SiO2 Substrate consists of a 200 nm thermally grown SiO2 film on an ultra-flat silicon wafer with a normal thickness of 675 um. The size is 5 mm x 5 mm. Graphene coverage of the TEM grid is better than 75 percent. Available in four thicknesses of CVD graphene, 1, 2, 3-5, and 6-8.
Layers: 3-5 layers
Thickness: 1.0-1.7 nm
Transparency: 85.8-90.4%
Electron Microscopy Sciences Graphene on Thermal SiO2 on Ultra-Flat Silicon, 2 layers, 0.7 nm thick, 92.7% Transparency
CVD graphene on ultra-flat thermal SiO2. The high quality graphene is produced by chemical vapor deposition, a process by which gaseous reactants are deposited onto a substrate. The Ultra-flat Thermal SiO2 Substrate consists of a 200 nm thermally grown SiO2 film on an ultra-flat silicon wafer with a normal thickness of 675 um. The size is 5 mm x 5 mm. Graphene coverage of the TEM grid is better than 75 percent. Available in four thicknesses of CVD graphene, 1, 2, 3-5, and 6-8.
Layers: 2 layers
Thickness: 0.7 nm
Transparency: 92.7%
Electron Microscopy Sciences Quantifoil Holey Carbon Film R 2/4 Special Copper, 200 mesh Grid
QUANTIFOIL is a perforated support foil with pre-defined hole size, shape and arrangement. It has advantages in electron microscopy (EM) or low-energy electron point source (LEEPS) microscopy when compared with conventional holey film.
QUANTIFOIL with circular holes is used in cryo-electron tomographic reconstruction. The roundness of the holes is advantageous with respect to the formation of an ice layer of constant thickness. The whole size chosen depends on the magnification used, and on whether or not one wishes to include support film in the image. Assessment of the image quality is easier when foil is included in the picture, because the power spectrum of a foil is stronger than that of unsupported ice.
Grid: Copper
Mesh: 200